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SPECIAL SECTION ON EXTREME-ULTRAVIOLET LITHOGRAPHY

Guest Editorial: Extreme Ultraviolet Lithography
Kevin Cummings and Kazuaki Suzuki
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 040901 (Dec. 22, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (22 kB)  ]

Extreme ultraviolet lithography's path to manufacturing
Harry J. Levinson
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041501 (Dec. 22, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (488 kB)  ]

Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography
Simi A. George, Patrick P. Naulleau, Senajith Rekawa, Eric Gullikson, and Charles Drew Kemp
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041502 (Oct. 2, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (882 kB)  ]

Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography
Ahmed Hassanein, Valeryi Sizyuk, Tatyana Sizyuk, and Sivanandan Harilal
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041503 (Oct. 2, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (616 kB)  ]

Performance results of laser-produced plasma test and prototype light sources for EUV lithography
Norbert R. Böwering, Igor V. Fomenkov, David C. Brandt, Alexander N. Bykanov, Alex I. Ershov, William N. Partlo, David W. Myers, Nigel R. Farrar, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffman, Christopher P. Chrobak, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David A. Vidusek, Silvia De Dea, and Richard R. Hou
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041504 (Oct. 5, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1374 kB)  ]

Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point-spread function, and flare map calibration
Gian F. Lorusso, Frieda Van Roey, Eric Hendrickx, Germain Fenger, Michael Lam, Christian Zuniga, Mohamed Habib, Hesham Diab, and James Word
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041505 (Oct. 5, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (667 kB)  ]

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for extreme ultraviolet lithography
Michael R. Sogard, Andrew R. Mikkelson, Vasu Ramaswamy, and Roxann L. Engelstad
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041506 (Nov. 2, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (444 kB)  ]

Development progress of optics for extreme ultraviolet lithography at Nikon
Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, and Jin Nishikawa
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041507 (Oct. 5, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (575 kB)  ]

Process liability evaluation for extreme ultraviolet lithography
Hajime Aoyama, Kazuo Tawarayama, Yuusuke Tanaka, Daisuke Kawamura, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Toshiro Itani, Hiroyuki Tanaka, Yumi Nakajima, Ryoichi Inanami, Kosuke Takai, Koji Murano, Takeshi Koshiba, Kohji Hashimoto, and Ichiro Mori
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041508 (Oct. 5, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (807 kB)  ]

Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond
Marc Bienert, Aksel Göhnemeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, and Steve Hansen
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041509 (Oct. 5, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (592 kB)  ]

Recent progress in developing an extreme ultraviolet full-field exposure tool at Selete
Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi, Yuusuke Tanaka, Seiichiro Shirai, and Hiroyuki Tanaka
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 041510 (Dec. 29, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (864 kB)  ]

ARTICLES

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Monica Laurel Kempsell, Eric Hendrickx, Alexander Tritchkov, Kyohei Sakajiri, Kenichi Yasui, Susuki Yoshitake, Yuri Granik, Geert Vandenberghe, and Bruce W. Smith
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043001 (Nov. 18, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1153 kB)  ]

Speckle in optical lithography and its influence on linewidth roughness
Oscar Noordman, Andrey Tychkov, Jan Baselmans, James Tsacoyeanes, Gary Politi, Michael Patra, Vladan Blahnik, and Manfred Maul
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043002 (Dec. 4, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (993 kB)  ]

Residual speckle in a lithographic illumination system
Gregg M. Gallatin, Naonori Kita, Tomoko Ujike, and Bill Partlo
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043003 (Nov. 25, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (367 kB)  ]

Line-edge-roughness transfer during plasma etching: modeling approaches and comparison with experimental results
Vassilios Constantoudis, George Kokkoris, Panagiota Xydi, Evangelos Gogolides, Erwine Pargon, and Mickaël Martin
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043004 (Dec. 1, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (737 kB)  ]

Study of the contour-based optical proximity correction methodology
Liang Zhu, Xiaohui Kang, Yili Gu, and Steve Yang
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043005 (Oct. 2, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (694 kB)  ]

Design-specific variation in pattern transfer by via/contact etch process: full-chip analysis
Valeriy Sukharev, Ara Markosian, Armen Kteyan, Levon Manukyan, Nikolay Khachatryan, Jun-Ho Choy, Hasmik Lazaryan, Henrik Hovsepyan, Seiji Onoue, Takuo Kikuchi, and Tetsuya Kamigaki
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043007 (Dec. 4, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (604 kB)  ]

Nonionic photoacid generator behavior under high-energy exposure sources
Richard A. Lawson, David E. Noga, Laren M. Tolbert, and Clifford L. Henderson
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043010 (Nov. 6, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (460 kB)  ]

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists
Jeffrey R. Strahan, Jacob R. Adams, Wei-Lun Jen, Anja Vanleenhove, Colin C. Neikirk, Timothy Rochelle, Roel Gronheid, and C. Grant Willson
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043011 (Dec. 30, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (265 kB)  ]

Chalcogenide glass e-beam and photoresists for ultrathin grayscale patterning
Andriy Kovalskiy, Jiri Cech, Miroslav Vlcek, Christopher M. Waits, Madan Dubey, William R. Heffner, and Himanshu Jain
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043012 (Dec. 22, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1061 kB)  ]

Predicting distortions and overlay errors due to wafer deformation during chucking on lithography scanners
Kevin T. Turner, Sathish Veeraraghavan, and Jaydeep K. Sinha
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043015 (Nov. 6, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1047 kB)  ]

Thick-membrane-operated radio frequency switches with wafer-level package using gold compressive bonding
Jongseok Kim, Sangwook Kwon, Youngtack Hong, Insang Song, Heemoon Jeong, Hyung Choi, and Byeongkwon Ju
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043020 (Oct. 2, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (636 kB)  ]

In situ measurement of gas diffusion properties of polymeric seals used in MEMS packages by optical gas leak testing
Changsoo Jang, Arindam Goswami, Bongtae Han, and Suk-Jin Ham
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043025 (Oct. 2, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1010 kB)  ]

Effects of layers and vias on continuous-wave laser heating and damage of surface-micromachined structures
Justin R. Serrano and Leslie M. Phinney
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043030 (Oct. 22, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (641 kB)  ]

Novel approach for microassembly of three-dimensional rotary MOEMS mirrors
Lidai Wang, James K. Mills, and William L. Cleghorn
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043035 (Oct. 29, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1134 kB)  ]

Feedback-stabilized deformable membrane mirrors for focus control
Sarah J. Lukes, Phillip A. Himmer, Eric J. Moog, Steven R. Shaw, and David L. Dickensheets
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043040 (Oct. 27, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (325 kB)  ]

Gap regulation for suspended rotating disk used for microgyroscopes
Nan-Chyuan Tsai, Bing-Hong Liou, and Chih-Che Lin
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043045 (Oct. 29, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1154 kB)  ]

Analysis and fabrication of reciprocal motors applied for microgyroscopes
Nan-Chyuan Tsai, Jiun-Sheng Liou, Chih-Che Lin, and Tuan Li
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043046 (Dec. 15, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1727 kB)  ]

Formation of uniform nanoscale oxide layers assembled by overlapping oxide lines using atomic force microscopy
Ampere A. Tseng, Taewoo Lee, Andrea Notargiacomo, and T. P. Chen
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043050 (Dec. 11, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (601 kB)  ]

Fabrication of giant magneto resistance sensing devices with vertically grown Co/Cu nanowires on a substrate
Thong C. Le, Hargsoon Yoon, Linfeng Chen, Roy C. McCann, and Vijay K. Varadan
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043055 (Dec. 21, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (779 kB)  ]

Fabrication of silicon microring resonator with smooth sidewalls
Yao Chen, Junbo Feng, Zhiping Zhou, Jun Yu, Christopher J. Summers, and David S. Citrin
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043060 (Nov. 13, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (316 kB)  ]

Development of polymer electrostatic comb-drive actuator using hot embossing and ultraprecision cutting technology
Satoshi Amaya, Dzung Viet Dao, and Susumu Sugiyama
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043065 (Dec. 4, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (579 kB)  ]

Efficient simulation and optimization of wafer topographies in double patterning
Feng Shao, Peter Evanschitzky, Tim Fühner, and Andreas Erdmann
J. Micro/Nanolith. MEMS MOEMS Vol. 8, 043070 (Dec. 31, 2009)
Abstract     Full Text:  [ HTML Sectioned HTML    PDF (1075 kB)  ]